In the realm of modern precision optics and semiconductor manufacturing, the demand for optical materials with exceptional purity, broad spectral transmission, and thermal stability is ever-increasing. JGS1 Quartz Glass, a high-purity synthetic fused silica produced via flame fusion, is specifically engineered for deep ultraviolet (DUV) applications. With its outstanding transmittance below 200 nm, JGS1 is widely used in high-end laser systems, photolithography, and UV analytical instruments, serving as a fundamental material in DUV optical systems.

1. Overview

JGS1 Quartz is a high-purity synthetic fused silica manufactured by the flame fusion method. It features extremely low metallic impurity levels, exceptional optical homogeneity, and excellent DUV transmission. Compared to standard fused quartz materials, JGS1 delivers superior performance across the 185–2500 nm wavelength range, especially in the deep ultraviolet region (190–250 nm), where standard materials typically underperform.
As a result, JGS1 is considered the preferred material for high-precision components such as photomask substrates, deep-UV laser windows, and various UV-grade optical elements.

2. Key Properties

 Optical Properties

Property	Typical Value
Transmission Range	185 nm – 2500 nm
UV Transmission (@200 nm)	> 85%
Refractive Index (@589.3 nm)	Approx. 1.458
Optical Homogeneity	Excellent (low birefringence, low dispersion)
Internal Stress & Inclusions	Extremely low

 Thermal and Mechanical Properties

Property	Typical Value
Density	2.2 g/cm³
Coefficient of Thermal Expansion	5.5 × 10⁻⁷ /°C
Continuous Operating Temperature	≤ 1000°C
Short-Term Thermal Resistance	Up to 1200°C
Mohs Hardness	6.5
Thermal Shock Resistance	Excellent

3. Comparison with Other Fused Silica Grades

Within the JGS series, JGS1 is the only grade offering high transmission in the deep UV (<200 nm) range. The following table compares JGS1 with JGS2 and JGS3:
 

Grade	Transmission Range (nm)	Key Features	Typical Applications
JGS1	185 – 2500	Exceptional DUV transmission, ultra-high purity	ArF/KrF laser optics, DUV lithography, photomask substrates
JGS2	220 – 2500	General-purpose UV-visible optics, cost-effective	Laser windows, imaging optics
JGS3	260 – 2500	Optimized for visible spectrum, cost-sensitive	Filters, general-purpose optics

4. Typical Applications

• Deep UV Laser Systems
With its outstanding transmission at 193 nm (ArF) and 248 nm (KrF), JGS1 is ideal for optical components in DUV laser systems. Its thermal stability and optical reliability make it suitable for both industrial laser processing and scientific instrumentation.
• Photomask Substrates for Lithography
In semiconductor manufacturing, DUV lithography requires substrates with minimal absorption, low birefringence, and high thermal stability. JGS1 is a leading choice for photomask blanks and reticle substrates due to its ultra-low impurity content and superior optical clarity.
• Spectroscopy and Analytical Instruments
JGS1’s full-spectrum transmission from UV through NIR makes it suitable for UV/VIS/NIR spectrometers, fluorescence detection, trace chemical analysis, and environmental monitoring—offering both high sensitivity and low background noise.
• Vacuum UV Windows
Thanks to its chemical purity and low absorption in the short-wave UV range, JGS1 can be used as a transmission or observation window in vacuum UV (VUV) systems, such as synchrotron beamlines and plasma chambers.

5. Processing Capabilities and Product Forms

JGS1 quartz glass can be custom fabricated into a wide range of optical and structural components, including:
Precision-polished optical windows
Photomask substrates
UV-grade lenses and prisms
High-purity carrier substrates
Fused silica wafers for optical or semiconductor use
Various sizes, thickness tolerances, flatness levels (e.g., λ/10), and surface qualities (e.g., 10-5 scratch-dig) are available according to application-specific requirements.

6. Conclusion

As deep ultraviolet technology continues to evolve, optical materials must meet increasingly stringent performance demands. JGS1 Quartz Glass, with its unmatched UV transmittance, high thermal tolerance, and optical precision, stands out as an indispensable material for advanced photonic, semiconductor, and laser applications.
Whether in lithographic systems, DUV laser optics, UV spectroscopy, or scientific research, JGS1 provides reliable and repeatable performance, making it the material of choice for critical applications in the DUV spectrum.
If you would like access to technical datasheets, quotation support, or design consultation for JGS1-based optical or substrate components, please feel free to contact us.